The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1988
Filed:
May. 27, 1986
Applicant:
Inventors:
Norihiko Shinkai, Kanagawa, JP;
Takeshi Haranoh, Yokohama, JP;
Junetsu Kanazawa, Yokohama, JP;
Takashi Hatano, Yokohama, JP;
Assignee:
Asahi Glass Company Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; B32B / ;
U.S. Cl.
CPC ...
430-5 ; 428432 ; 428427 ; 428698 ; 428699 ; 428701 ;
Abstract
A photomask blank comprising a transparent substrate and at least two layers including a masking layer and an antireflection layer, formed thereon, wherein said masking layer is a chromium masking layer containing more than 25% by atomic ratio of nitrogen, and said antireflection layer is a chromium oxide antireflection layer containing more than 25% by atomic ratio of nitrogen.
Shinkai, Norihiko. (1988). Photomask blank and photomask (U.S. Patent No. 4720442). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4720442
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile