The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 1988
Filed:
Nov. 17, 1986
Applicant:
Inventors:
Augustin Siegel, Oberkochen, DE;
Peter Seidel, Steinheim, DE;
Assignee:
Carl-Zeiss-Stiftung, Heidenheim/Brenz, DE;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N / ;
U.S. Cl.
CPC ...
356237 ; 250563 ;
Abstract
A method used for the inspection of semiconductor structures under a light scan microscope which scans the surface of the wafer or other specimen (12) with a beam of light which is focused in spot form by the objective (18). In order to produce a dark-field image in which the linear semiconductor structures of the wafer are suppressed and only defects and particles of dirt are visible, the signals of four detectors (10a-10d) arranged outside the illuminating aperture of the objective within the channel of the dark-field ring condenser (6) are subjected to a logical 'and' operation.