The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1988
Filed:
Aug. 06, 1986
Toshiro Tahara, Kanagawa, JP;
Kaoru Uchiyama, Kanagawa, JP;
Seiichi Yamazaki, Kanagawa, JP;
Kiichiro Sakamoto, Kanagawa, JP;
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
A photosensitive material guide structure for use in a developing apparatus adapted to develop a photosensitive material having been subjected to light exposure has at least one pair of feed rollers which feed forward the photosensitive material while clamping it therebetween within the developing apparatus. Both axial end portions of at least one of the pair of feed rollers are reduced in diameter. Accordingly, when the rollers clamp the photosensitive material to feed it, both the lateral edge portions of the photosensitive material are subjected to a clamping force which is weaker than that applied to the other portion of the material.