The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 12, 1988

Filed:

Apr. 27, 1987
Applicant:
Inventors:

Bernhard Falk, Rheinfelden-Minseln, DE;

Klaus Ruff, Troisdorf, DE;

Klaus Schrage, Konigswinter, DE;

Assignee:

Dynamit Nobel AG, Cologne, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C01B / ; C01B / ;
U.S. Cl.
CPC ...
423335 ; 423325 ; 423341 ; 423342 ;
Abstract

Disclosed is a process for the cleavage of chlorosiloxanes in the gas phase at temperatures between 350 and 1450.degree. C. to form chlorosilanes and silicon dioxide as reaction products. The claimed process is preferably performed in the presence of metallic silicon or ferrosilicon. The procedure can be combined with the large-scale technical production of chlorosilanes by the chlorination or hydrochlorination of silicon. The inventive process makes it possible to perform the chlorination or hydrochlorination of silicon with the formation of chlorosilanes in an increased yield while reducing the formation of by-products.


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