The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 12, 1988
Filed:
Oct. 02, 1984
Applicant:
Inventor:
Junji Hazama, Kawasaki, JP;
Assignee:
Nippon Kogaku K.K., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01K / ;
U.S. Cl.
CPC ...
356381 ; 356314 ;
Abstract
A method whereby the circuit pattern on a photographic mask or a reticle used in the manufacture of semiconductor devices is inspected for defects by an image processing technique. In this inspection method, the pattern of the mask is printed on a photosensitive member prepared by forming an opaque or semitransparent photosensitive layer on a transparent substrate and an image of the printed pattern formed on the photosensitive member is inspected by the image processing technique.