The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 22, 1987
Filed:
Apr. 18, 1986
Hirotane Ikeda, Nishio, JP;
Tadashi Hattori, Okazaki, JP;
Minoru Ohta, Okazaki, JP;
Shinichi Mukainakano, Okazaki, JP;
Nippon Soken, Inc., Nishio, JP;
Abstract
A method for forming an ultrafine particle film of compound includes the steps of evacuating a vessel provided with an evaporation source in its bottom portion, by which a material to be evaporated is retained, and a base plate in its upper portion, on which ultrafine particles of compound are to be deposited, supplying a reactive gas into the evacuated vessel, evaporating the retained material by heating the evaporation source and making the material interact with the reactive gas to form ultrafine particles of compound and depositing the formed ultrafine particles of compound on the base plate. The reactive gas is directly supplied to an interaction area adjacent to the evaporation source, in which the evaporated material concentrically exists. And a device for forming a ultrafine particle film of compound has a vessel for forming a reactive gas atmosphere, an evaporation source for retaining and heating a material to be evaporated, which is provided in the bottom portion within the vessel, a base plate on which ultrafine particles of compound are to be deposited and which is provided in the upper portion within the vessel so as to be opposed to the evaporation source in the vertical direction, and a gas introducing pipe for supplying a reactive gas into the vessel, which has a gas injection port positioned in an interaction area adjacent to the evaporation source.