The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 1987
Filed:
Jul. 03, 1986
Applicant:
Inventor:
Hisatsugu Torii, Kanagawa, JP;
Assignee:
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ;
U.S. Cl.
CPC ...
355 74 ;
Abstract
An exposure mask adapted to be used with a micro camera whose microfilming format is changeable, is provided with an exposure aperture defining the size of the frames of the micro images to be recorded on a film. The mask has at least one data exposure aperture outside the exposure aperture, and is provided with an information section which is either mechanically or photoelectrically detected by a detecting member in the micro camera in order to change completely the microfilming camera format of the micro camera in accordance with the type of the exposure mask.