The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 01, 1987
Filed:
Nov. 12, 1985
Kinya Katoh, Tokyo, JP;
Nippon Kogaku K. K., Tokyo, JP;
Abstract
A projection type exposing apparatus includes a projection objective for projecting the image of a reticle having a predetermined pattern and a plurality of alignment marks onto a wafer, photoelectric alignment means having an imaging optical system for forming the images of the alignment marks on the reticle, a photoelectric detecting slit member disposed at a predetermined image position of the imaging optical system, and a slit image displacing optical member disposed in the optical path of the imaging optical system to optically displace the image position of the slit member on the reticle in a direction perpendicular to the lengthwise direction of the slit member, the slit member being designed such that the lengthwise direction thereof is coincident with a straight line intersecting the optic axis of the projection objective on the reticle, a movable stage for supporting the wafer thereon for movement relative to the projection objective, and a reference index mark member provided on the movable stage to set the reference position of the slit member in the photoelectric alignment means relative to the movable stage.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile