The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 24, 1987
Filed:
Mar. 27, 1985
Heinz Kraus, Traunreut, DE;
Dr. Johannes Heidenhain GmbH, Traunreut, DE;
Abstract
In a process for forming an incident-light phase grid for a photoelectric positioning apparatus, a transparent substrate supports a first structured reflecting layer which is created by a photolithographic process by a first photolacquer layer exposed through an exposure mask. A whole surface thick spacer layer is applied to the structure carrying side of the substrate, and a second structured reflecting layer is formed on the spacer layer by photolithographic methods, including a second photolacquer layer which is exposed through the structured reflecting layer acting as an exposure mask.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile