The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 1987
Filed:
Apr. 10, 1985
Applicant:
Inventors:
Masaaki Futamoto, Tsukui, JP;
Yukio Honda, Fuchu, JP;
Yasutaro Uesaka, Kokubunji, JP;
Kazuetsu Yoshida, Kodaira, JP;
Assignees:
Hitachi, Ltd., Tokyo, JP;
Hitachi Maxell Ltd., Osaka, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B / ;
U.S. Cl.
CPC ...
360131 ; 360134 ; 360135 ; 360136 ; 428641 ; 428611 ; 428900 ; 428694 ; 427128 ; 427131 ;
Abstract
Disclosed is a perpendicular magnetic recording medium wherein an underlayer made of a material containing Si and/or Ge as its principal ingredient is deposited on a substrate, and a perpendicular magnetic film made of a Co-based alloy is deposited on the underlayer. With the perpendicular magnetic recording medium, the perpendicular magnetic film has an enhanced degree of C-axis orientation, and the bond strength between the perpendicular magnetic film and the substrate is also enhanced when the substrate is non-metallic.