The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 1987

Filed:

Jun. 26, 1986
Applicant:
Inventors:

John Haigh, Ipswich, GB;

Martin R Aylett, Felixstowe, GB;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ; B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156635 ; 156643 ; 156646 ; 156654 ; 156662 ; 20419232 ; 2191 / ; 2191 / ; 252 791 ;
Abstract

Materials whose elemental constituents are selected from groups III and V of the Periodic Table are photochemically etched in a reducing environment. Etching is carried out by illuminating a halogenated hydrocarbon gas, e.g. methyl iodide, with ultra-violet light in the vicinity of the material. The reducing environment is provided by the presence of sufficient hydrogen to suppress the effect of any oxygen leaking into the system. Methods according to the invention may be used in particular in the production of opto-electronic devices.


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