The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1987
Filed:
May. 27, 1986
Hiroshi Kimura, Sendai-shi, Miyagi 982, JP;
Kenji Abiko, Sendai-shi, Miyagi 982, JP;
Other;
Nihon Shinku Gijutsu Kabushiki Kaisha, Chigasaki, JP;
Olympus Optical Company Limited, Tokyo, JP;
Abstract
A high temperature microscope having an optical system and a chamber system is disclosed. Frictional rotation of the peep window provided in the chamber system is caused together with frictional rotation of a first flange, in which the peep window is provided, and a second flange, which surrounds the first flange and is surrounded by a stationary third flange. It is thus possible to greatly delay the limit of the period, during which observation of the object can be made, due to fogging of the peep window. Double wall sealing ring members are provided between the first and second flanges and between the second and third flanges of the chamber of the high temperature microscope. The space between the double wall sealings can be evacuated through an inverted T-shaped ventilation hole provided in the second flange. Thus, the chamber can be evacuated to a superhigh vacuum higher than the vacuum degree obtainable in the chamber of the prior art high temperature microscope.