The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 10, 1987
Filed:
May. 05, 1986
Applicant:
Inventors:
George E Possin, Schenectady, NY (US);
Harold G Parks, Scotia, NY (US);
William W Piper, Scotia, NY (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
437 40 ; 156643 ; 148D / ; 437101 ; 437233 ;
Abstract
An organic or inorganic base solution is employed as a means for passivating the back channel region of an amorphous silicon FET device following plasma etching of the back channel region. The passivation provided significantly reduces back channel leakage currents resulting in FET devices which are compatible with conventional processing methods and which exhibit desirable properties for use in liquid crystal display systems.