The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 1987
Filed:
Feb. 21, 1986
Allen P Blacker, Jr, Hoffman Estates, IL (US);
John A Christensen, Des Plaines, IL (US);
Khem K Garewal, Hoffman Estates, IL (US);
Zenith Electronics Corporation, Glenview, IL (US);
Abstract
An electron gun system according to the invention comprises means including cathode means for developing an electron beam. Main focus lens means, which has a plurality of electrode means situated on a common axis, provide for receiving the electron beam and forming a focused electron beam spot at the screen of the tube. Means are provided for developing and applying to the electrode means potentials effective to form one or more focusing field components between the electrode means. The lens means is so structured and arranged as to cause to be formed between adjacent electrode means at least one focusing field component which is asymmetrical and effective to significantly divert a passed beam from a straight-line path through a predetermined angle. A first of the plurality of electrode means comprises focus electrode means adapted to receive focus voltages for establishing the focal distance of the beams. A second of the plurality of electrode means cooperates with another of the plurality of electrode means to form the asymmetrical field component. Means according to the invention provide for developing and applying a varying voltage to the second electrode means to cause the strength of ther asymmetric field component, and thus the angle by which the beam is diverted, to vary in response to the varying voltage.