The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 1987
Filed:
Nov. 29, 1985
Applicant:
Inventor:
Ronald E Enstrom, Skillman, NJ (US);
Assignee:
RCA Corporation, Princeton, NJ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118715 ; 118725 ; 4272552 ;
Abstract
An apparatus for the treatment of a substrate with two or more gases includes a reaction chamber with an outlet and an inlet, and a gas introduction manifold comprising a closed hollow body with a cylindrical interior. Feed ports, extending through a wall of the body, are integral with valves disposed about said body. An aperture extends through an end surface of the body which aperture is connected to the inlet of the chamber. The valves are disposed such that they are at equal distances from the center axis of the inlet.