The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 03, 1987
Filed:
Jun. 16, 1986
Nick Mardesich, Simi Valley, CA (US);
Spectrolab, Inc., Sylmar, CA (US);
Abstract
A method for providing deep impurity doped regions under the back contacts of a solar cell. In a semiconductor wafer with a p-n junction therein defining an n+ layer emitter and p-type layer bulk, a p+ layer is formed in the p-type layer under the back surface of the wafer. An oxide passivation layer is disposed over the back surface. Metal paste is screen printed onto the oxide layer in a predetermined pattern. The combination is heated to a temperature such that the metal paste will drive through the oxide layer and alloy with selected regions of p+ layer and p-type layer to a predetermined depth forming heavily doped p+ impurity regions. Metallization is applied onto the oxide layer making electrical contact with the heavily doped p+ impurity regions.