The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 27, 1987

Filed:

Oct. 22, 1984
Applicant:
Inventors:

Masaru Kadono, Nara, JP;

Kumio Nago, Nara, JP;

Tatsushi Yamamoto, Nara, JP;

Tersuro Muramatsu, Nara, JP;

Shuuhei Tsuchimoto, Nara, JP;

Mitsuhiko Yoshikawa, Nara, JP;

Masatoshi Tomita, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ; C23C / ;
U.S. Cl.
CPC ...
427 42 ; 427129 ; 427132 ; 427250 ; 427255 ; 427314 ; 427319 ;
Abstract

A production method for producing a high permeability alloy film which includes evaporating an alloy material composed of 1-6 wt % Al, 20-35 wt % Si, and the remainder of iron by irradiating the alloy with an electron beam, and then depositing the vapor from the alloy material onto a substrate for a predetermined time to produce an alloy film composition having a high permeability. The vapor deposition onto the substrate is preferably intercepted with the shutter until the concentration of aluminum of the vapor to be deposited has been decreased to a value between 20 and about 4 wt %.


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