The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 1987
Filed:
Jan. 30, 1986
Applicant:
Inventors:
Tsuneo Nakamura, Nara, JP;
Hidenori Yamasaki, Yamatokoriyama, JP;
Tohru Kira, Tenri, JP;
Mitsuhiko Yoshikawa, Ikoma, JP;
Assignee:
Sharp Kabushiki Kaisha, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ;
U.S. Cl.
CPC ...
156643 ; 156650 ; 156653 ;
Abstract
There is disclosed a process for modifying in an oxygen plasma an inert reaction product produced on a Fe-Al-Si alloy back core during a production of a thin film magnetic head utilizing a reactive ion etching (RIE) process. As a result of modifying the reaction product it is made readily soluble in and thus removable by water.