The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1987
Filed:
Oct. 22, 1985
Applicant:
Inventors:
Yasunari Soda, Kokubunji, JP;
Kozo Mochiji, Hachioji, JP;
Takeshi Kimura, Higashimurayama, JP;
Hidehito Obayashyi, Burlingame, CA (US);
Assignee:
Hitachi, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K / ;
U.S. Cl.
CPC ...
378 34 ; 378 35 ; 378145 ;
Abstract
A process of X-Y lithography including providing a linearly polarized X-ray, and irradiating a resist on a substrate through a mask with the linearly polarized X-ray to form a pattern shape which is utilized for production of, for example, a semiconductor device or magnetic bubble memory device.
Soda, Yasunari. (1987). Linearly polarized x-ray patterning process (U.S. Patent No. 4701940). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4701940
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile