The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1987
Filed:
Jul. 03, 1986
Applicant:
Inventors:
Hajime Serizawa, Koriyama, JP;
Keizo Ogihara, Sukagawa, JP;
Kiyoshi Shimizu, Koriyama, JP;
Susumu Harada, Tokyo, JP;
Assignee:
Nitto Boseki Co., Limited, Fukushima, JP;
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F / ;
U.S. Cl.
CPC ...
525292 ; 525298 ; 525301 ; 525312 ; 522149 ;
Abstract
A process for producing a novel photosensitive resin having cinnamic groups, comprising reacting a polyallylamine represented by the general formula (I) ##STR1## (wherein n is at least 10) or an inorganic acid salt thereof with a compound having a cinnamic group in the presence of a solvent. The process is free from drawbacks as experienced in the production of a conventional photosensitive resin (e.g. polyvinyl cinnamate), such as formation of by-products during the polymerization of a monomer (e.g. vinyl cinnamate).