The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 20, 1987

Filed:

Feb. 25, 1985
Applicant:
Inventors:

Teruo Nagano, Kanagawa, JP;

Tadao Toyama, Shizuoka, JP;

Akira Nagashima, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ; G03C / ; G03C / ;
U.S. Cl.
CPC ...
430179 ; 430175 ; 430191 ; 430196 ; 430281 ; 430283 ; 430284 ; 430285 ; 430286 ; 430287 ; 430920 ; 430925 ; 548143 ;
Abstract

A photosensitive composition containing a 2-halomethyl-5-substituted-1,3,4-oxadiazole compound represented by the following general formula (I): ##STR1## wherein A represents a substituted or unsubstituted aromatic residue; X represents a hydrogen atom, a cyano group, an alkyl group or an aryl group; Y represents a chlorine atom or a bromine atom; and n represents an integer of 1 to 3. The free radical generating agent represented by the general formula (I) has a photosensitive wavelength range from near ultraviolet range to visible range, high photo-decomposition sensitivity and good compatibility with other components present in the photosensitive composition. The photosensitive composition is suitable for use in light-sensitive printing plates or photo-resists.


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