The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 20, 1987
Filed:
Jul. 01, 1985
Applicant:
Inventors:
Harry W Deckman, Clinton, NJ (US);
Richard B Stephens, Annandale, NJ (US);
J Thomas Tiedje, Lebanon, NJ (US);
Benjamin Abeles, Annandale, NJ (US);
Assignee:
Exxon Research and Engineering Company, Florham Park, NJ (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ; B32B / ; B32B / ; B01J / ;
U.S. Cl.
CPC ...
428188 ; 428189 ; 4283159 ; 428543 ; 502 60 ; 502 64 ; 156643 ; 156644 ; 156655 ; 156657 ; 156D / ; 427270 ; 427271 ; 427272 ;
Abstract
A high surface area substrate with controlled pore size and slot geometry is made by depositing at least two materials in alternating layers. The film is then broken up and one of the materials is etched away to produce a slotted surface structure. These slots can add size and shape selectively to separations and catalytic processes which because of the uniform and controllable dimensions (>5A) would be superior to that obtainable from zeolites and clays.