The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1987
Filed:
Dec. 24, 1985
David M Camm, Vancouver, CA;
Arne Kjorvel, Vancouver, CA;
Nicholas P Halpin, Vancouver, CA;
Anthony J Housden, North Vancouver, CA;
Vortek Industries, Ltd., Vancouver, CA;
Abstract
A high intensity radiation source. A liquid vortex wall is formed on the inside surface of an arc chamber to restrict the diameter of an arc generated between electrodes. The liquid vortex wall is obtained by utilizing a vortex generating means which includes an annular restriction through which the liquid must pass prior to entering the arc chamber. The annular restriction is of a dimension sufficient to allow adequate pressure and velocity throughout the arc chamber and to reduce or eliminate flow irregularities which could be transmitted to the liquid wall in the arc chamber. A nozzle may provide for establishment of the required axial vortex flow motion of both the liquid and gas while the liquid and gas are physically separated prior to their entrance to the arc chamber. A discharge chamber adjacent the arc chamber is tapered smoothly to prevent flow disruptions and fin means on the electrode is provided to reduce gas and liquid flow in the opposite direction to that normally occurring in the arc chamber.