The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 13, 1987
Filed:
Sep. 06, 1985
Sosuke Kawashima, Kudamatsu, JP;
Kazuaki Ichihashi, Kudamatsu, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
This invention is directed to a vacuum processing apparatus which is constructed so that a sample may be carried between a main vacuum chamber and a portion of the atmosphere outside the main vacuum chamber while the sample is retained in a vertical position. The sample is carried in the vertical position through several chambers, including a first vacuum preparatory chamber provided to be communicable with the main vacuum chamber and a second vacuum preparatory chamber provided to be communicable with both the first vacuum preparatory chamber and the atmosphere. By using this apparatus, and in particular by conveying the sample in a vertical position, it is possible to restrain the adhesion of foreign substances on the sample surface which is to be treated. It is also possible to reduce the vacuum load and properly maintain pressure within the main vacuum chamber, thereby enabling increased quality of treatment and also enhancing the manufacturing yield of a semiconductor element.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile