The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1987
Filed:
Nov. 17, 1986
Applicant:
Inventors:
Assignee:
Motorola, Inc., Schamburg, IL (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C / ; C03C / ; C03C / ;
U.S. Cl.
CPC ...
156643 ; 156646 ; 156651 ; 156655 ; 1566591 ; 156657 ; 20419232 ;
Abstract
A process described provides a sloped contact etch. The process has the steps of: etching a substrate then removing the polymer that is produced during the substrate etch. These two steps are alternated until a desired depth is reached. Next, the resist is etched followed by an etch of the substrate. This is then repeated until the required depth is reached. By varying the duration and repetition of the etches, the slope of the etch can be regulated.
Berglund, Robert. (1987). Sloped contact etch process (U.S. Patent No. 4698128). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4698128
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile