The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 06, 1987
Filed:
Feb. 26, 1985
Mrinal K Thakur, Waltham, MA (US);
Sukant K Tripathy, Arlington, MA (US);
Daniel J Sandman, Acton, MA (US);
GTE Laboratories Incorporated, Waltham, MA (US);
Abstract
Methods for preparing thin large-area single crystals of diacetylenes and polydiacetylenes having surface dimensions greater than or equal to about 0.1 mm on all sides and a uniform thickness less than or equal to about 100 microns. The methods involve forming a liquid layer, preferably by melting crystals of a pure diacetylene monomer between two opposed surfaces, one surface being movable with respect to the other; applying pressure to the molten monomer layer disposed between the two surfaces; shearing the molten layer by sliding the movable surface in a single direction that is in a straight line across the molten monomer layer while keeping the molten monomer layer under constant pressure; and crystallizing the shorn molten monomer layer while the shorn molten monomer layer is kept under constant pressure to form a thin large-area single crystal of pure diacetylene monomer. The method for preparing thin large-area single crystals of polydiacetylene further involves exposing a surface of the thin large-area single crystal of diacetylene monomer to ultraviolet or gamma radiation to form a thin large-area single crystal of polydiacetylene.