The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 29, 1987
Filed:
Jun. 24, 1985
Applicant:
Inventors:
Makoto Hanabata, Ibaraki, JP;
Akihiro Furuta, Takarazuka, JP;
Seimei Yasui, Takarazuka, JP;
Kunihiko Tanaka, Nara, JP;
Assignee:
Sumitomo Chemical Company, Limited, Osaka, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03C / ; G03C / ;
U.S. Cl.
CPC ...
430192 ; 430165 ; 430190 ; 430193 ; 430326 ;
Abstract
A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer and as a photo-sensitizer a quinonediazide compound is disclosed. A positive type photoresist composition comprising an m-hydroxy-.alpha.-methylstyrene polymer, a novolak resin, and as a photo-sensitizer a quinonediazide compound, is also disclosed.