The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 15, 1987
Filed:
Oct. 11, 1985
Atsushi Saiki, Koganei, JP;
Michio Suzuki, Hino, JP;
Hideo Sunami, Nishitama, JP;
Shojiro Asai, Tsukui, JP;
Michiyoshi Maki, Hachioji, JP;
Kinichiro Asami, Niiza, JP;
Hitachi Plant Engineering & Construction Co., Ltd., Tokyo, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A clean room wherein clean air obtained through filters from the upper portion of the clean room is blown toward the floor, through the openings in the floor, and with the clean air being discharged again through the filters from the upper portion of the clean room. The air flow rate of clean air in the aisle areas is greater than the air flow rate in the wafer handling areas, and the opening rate of the floor is smaller in the portion near to an air return under the floor than in the portion remote from the air return thereby greatly reducing the diffusion of dust to the wafer handling areas.