The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1987
Filed:
Nov. 08, 1984
James M Forsyth, Pittsford, NY (US);
Hampshire Instruments, Rochester, NY (US);
Abstract
Disclosed herein is a X-ray lithography system in which X-rays are generated by a laser beam focused upon a target within an evacuated chamber to create a soft X-ray emitting plasma which also emits debris particles. A thin sheet of X-ray transparent gas is provided between the target and a mask used in the lithographic process to displace the particles away from the mask. The sheet of gas may also be used to maintain a pressure differential across an opening in the evacuated chamber through which the X-rays pass towards the target. In addition, the gas sheet may be used to cool the X-ray mask by placing the mask close to the sheet but at a sufficient distance so that the sheet does not interfere with the mask.