The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 1987
Filed:
Oct. 24, 1984
Yoshio Suzuki, Numazu, JP;
Toshiba Kikai Kabushiki Kaisha, Tokyo, JP;
Abstract
In an electrostatic chuck of the type wherein an electrode is covered by an insulating dielectric member, an object, typically a semiconductor wafer, to be electrostatically attracted is mounted on the dielectric member, and a potential difference is applied across the wafer and the electrode, the electrode is shaped such that the distribution of the electrostatic attractive force applied to the wafer would not be uniform throughout the attractive surface of the chuck. To this end the electrode is constituted by a plurality of spaced rings or bars or provided with a plurality of circumferentially spaced radial members. When the wafer is flexed downwardly, the thickness of the dielectric member is varied continuously from one to the other end. Where the electrode is divided into a plurality of split electrodes, variable resistors are provided to apply the same or different DC voltages to the split electrodes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile