The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 08, 1987

Filed:

Sep. 26, 1984
Applicant:
Inventors:

Giok D Khoe, Eindhoven, NL;

Henricus M De Vrieze, Eindhoven, NL;

Assignee:

U.S. Philips Corporation, New York, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C / ; H01L / ;
U.S. Cl.
CPC ...
1566591 ; 156663 ; 437225 ;
Abstract

On a support which supports a light-emitting semiconductor device there is arranged a cap which is hermetically sealed to the support. In the cap there is provided a transparent plate, an inner layer of which facing the semiconductor device consists of a material having a high refractive index (>1.7). On the outer side of the plate there is provided a layer of photosensitive lacquer which is exposed to the light emitted by the semiconductor device. After development of the layer of lacquer, only the exposed part which is situated opposite the semiconductor device remains. This part is heated to the melting point, thus forming a droplet of lacquer, after which the outer layer of the plate and the droplet of lacquer are removed by way of a non-selective etching method, so that a lens which is situated opposite the semiconductor device and a flat window which surrounds the lens are automatically formed at the same time.


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