The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 25, 1987

Filed:

May. 12, 1986
Applicant:
Inventors:

Takao Kawamura, Osaka, JP;

Keibun Ejima, Kagoshima, JP;

Naooki Miyamoto, Kagoshima, JP;

Hisashi Higuchi, Kagoshima, JP;

Yasuo Nishiguchi, Kagoshima, JP;

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03G / ;
U.S. Cl.
CPC ...
430 84 ; 430 69 ; 430128 ;
Abstract

The present invention relates to improvements in a substrate for producing an electrophotographic sensitive member having a photoconductive layer formed with amorphous silicon. An electrophotographic sensitive member, which is superior in moldability, corrosion resistance, strength, charging electric potential and the like, is formed when an aluminium material, which contains at least one of iron and manganese or a combination of each at 0.30 or less % by weight, is used as a substrate on which a photoconductive layer formed with amorphous silicon is laminated; and/or the surface roughness of said substrate is 0.5 S or less; and/or an aluminium substrate containing magnesium at 0.5 to 10.0% by weight is used.


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