The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 1987
Filed:
May. 15, 1986
Applicant:
Inventors:
Mitchell E Doty, Chalfont, PA (US);
Thom V Bernitsky, North Wales, PA (US);
Assignee:
Ametek, Inc., New York, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
4271261 ; 4272481 ; 4272552 ; 118300 ; 136260 ; 136264 ;
Abstract
Process and apparatus are disclosed for forming excellent quality, large area thin films essentially without discontinuities and inhomogenuities, particularly for photovoltaic solar cells. The reactants are conducted past a heated substrate in a relatively thin gap, e.g., 0.030 inch, in a turbulent flow. In a specific embodiment, the reactants are contained in nebuli of an atomized solution, and the nebuli are sorted, preferably by gravity, prior to introduction thereof into the gap to prevent introduction of larger size nebuli into the reaction gap.