The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 1987
Filed:
Jun. 11, 1985
Michel Philbert, Chatillon, FR;
Office National d'Etudes et de Recherche Aerospatiales (ONERA), Chatillon, FR;
Abstract
An optical system for analyzing and correcting wave fronts comprising a deformable mirror for correcting wave fronts and a system for analyzing and detecting phase distortion, an interferometer with lateral duplication constituting the analysis system, receiving the wave front for analysis and duplicating it and deducing from two neighboring wave fronts obtained signals to control deformation of the deformable mirror, wherein this lateral duplication interferometer is a polarization interferometer consisting of a Wollaston double-refractive biprism with an angle .theta., the two prisms being assembled head to tail and cut parallel to the crystallographic axis such that the respective axes are parallel and perpendicular to the edges of the prisms, a polarizer and an analyzer on either side of the biprism and an oscillating optical member on the path of the biprism.