The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 1987

Filed:

Jul. 23, 1985
Applicant:
Inventors:

Jun Kanamori, Tokyo, JP;

Mamoru Yokoyama, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
430313 ; 430314 ; 430317 ; 430323 ; 430326 ; 430327 ; 430329 ;
Abstract

An etching method is disclosed including a process of improving the adhesiveness between a positive resist layer and a material layer to be etched. The material layer to be etched is dipped in an organic solvent. The structural body thus-produced in the aforesaid process is placed in the atmosphere of Freon vapor to dry the material layer to be etched. The positive resist film is then formed on the surface of the material layer to be etched.


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