The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1987
Filed:
Oct. 15, 1985
Harold R Kaufman, Fort Collins, CO (US);
Raymond S Robinson, Fort Collins, CO (US);
Kaufman & Robinson, Inc., Fort Collins, CO (US);
Abstract
A broad-beam electron source has a chamber into which is introduced an ionizing gas. Electrons are emitted between a cathode and an anode assembly to ionize that gas. The electrons within the plasma are drawn outwardly from the chamber through an apertured wall, which constitutes a screen, and thereafter are accelerated toward a target in a well-directed beam. A comparatively copious supply of electrons is developed, while yet requiring only low voltages in connection with its generation and resulting in correspondingly low electron energies. Ions produced external to the electron source itself are utilized to assist in neutralizing the charge density of the electron beam in order to help maintain its definition. For insulative targets, secondarily emitted electrons permit conservation of surface charge.