The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1987
Filed:
Nov. 15, 1985
Norbert E Samek, Sierra Madre, CA (US);
IMO Delaval Inc., Lawrenceville, NJ (US);
Abstract
Biaxial strain gage and similar systems include or provide a substrate of semiconductor material having cubic unit cells and an absolute value of piezoresistive coefficient in a first direction different from an absolute value of piezoresistive coefficient in a second direction transverse to said first direction. A first strain gage has a dominant dimension oriented in the above mentioned first direction and is diffused into the substrate. A second strain gage has a dominant dimension in the above mentioned second direction and is diffused into the substrate. A pressure responsive diaphragm having a central area displaying essentially symmetrical biaxial strains is provided, and the substrate is attached in said central area to the diaphragm to expose the gages to the biaxial strains. Additionally, third and fourth strain gages may also be provided, but in either case, all strain gages are located within an area of the substrate corresponding to the central area of the diaphragm displaying essentially symmetrical biaxial strains.