The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 1987
Filed:
Apr. 08, 1986
Kothandaraman S Ravindhran, Mesa, AZ (US);
Narayan M Kulkarni, Mesa, AZ (US);
GTE Communication Systems Corp., Phoenix, AZ (US);
Abstract
A method of coding a ROM from a partially processed semiconductor wafer comprising a substrate, a plurality of spaced regions separated by regions of isolating oxide deposited in said substrate, a layer of gate oxide overlying each of said spaced regions and a gate electrode overlying each layer of said gate oxide, is described comprising the use of photoresist material for preventing the formation of source and drain regions under selected ones of said gate electrodes during a subsequent doping step. The photoresist material restricts the area of implantation of dopant used for forming source and drain regions in the ROM device.