The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 1987
Filed:
Oct. 16, 1986
Masakatsu Ohta, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An illumination apparatus for illuminating a surface, having formed thereon a pattern, to transfer the pattern onto a semiconductor wafer. The apparatus includes an elliptic mirror for forming an image of a light source, an imaging system for re-imaging the image of the light source, formed by the elliptical mirror, while causing a curvature of field, a multi-beam generating system disposed relative to the imaging system so that the optimum focus located at the off-axis position of the imaging system is coincident with an input surface of the multi-beam generating system, and a collimator for directing to the pattern surface a number of discrete light beams generated by the multi-beam generating system to illuminate the pattern surface. Whereby a uniform intensity distribution of the light illuminating the pattern surface and a high light-collecting efficiency are assured.