The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 28, 1987
Filed:
May. 05, 1986
Applicant:
Inventor:
John R Rairden, III, Schenectady, NY (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
427 34 ; 204164 ;
Abstract
Dense layers of metals and compounds may be formed on a receiving surface of complex geometry by use of a plasma spray technique in a vacuum chamber in which multiple guns are used simultaneously to deposit material confronting areas.
Rairden, III, John. (1987). Method of producing high quality plasma spray deposits of complex (U.S. Patent No. 4683148). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4683148
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile