The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 1987
Filed:
Nov. 14, 1985
Applicant:
Inventors:
Toshiro Takahashi, Hamamatsu, JP;
Tadao Tokushima, Hamamatsu, JP;
Yoshifumi Suzuki, Iwata, JP;
Yukio Wakui, Hamamatsu, JP;
Assignee:
Nippon Gakki Seizo Kabushiki Kaisha, Hamamatsu, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C25D / ;
U.S. Cl.
CPC ...
204 351 ; 204 376 ; 204 42 ;
Abstract
In production of magnetic recording media by anode oxidation of an Al predominant substrate, deposition of ferromagnetic substance in substrate pores and final grinding, use of a substrate having a surface K-value of 0.5 or larger enables easy production of media with surface roughness well suited for ideal high density magnetic recording. The K-value is the ratio of X-ray reflection intensity of the crystal plane S(1,1,1) and the toal X-ray reflection intensity of all crystal planes.