The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 1987
Filed:
Dec. 26, 1985
Applicant:
Inventors:
Vishu D Dosaj, Midland, MI (US);
Alvin W Rauchholz, Thomas Township, Saginaw County, MI (US);
Assignee:
Dow Corning Corporation, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B / ;
U.S. Cl.
CPC ...
204164 ; 423350 ;
Abstract
What is disclosed is a process for preparing silicon using a gas plasma as a heat source. The process comprises (a) generating a gas plasma in a reactor utilizing a transferred arc plasma configuration in which a minimum of gas is utilized to form a plasma; (b) feeding silicon dioxide and a solid reducing agent directly into the reactor and to the plasma; (c) passing the plasma gas, the silicon dioxide, and the solid reducing agent into a reaction zone of the reactor; (d) recovering molten silicon and the gaseous by-products.