The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 1987
Filed:
Aug. 12, 1985
Toshiyuki Inokuchi, Yokohama, JP;
Ricoh Company, Ltd., Tokyo, JP;
Abstract
This invention relates to an image forming optical apparatus in which a number of micro-lenses are arranged, and images formed by said lenses are superposed to obtain a synthesized image. In the optical apparatus of this kind, individual images have their respective irradiance distribution, and therefore, unevenness in the irradiance distribution of the synthesized image has to be minimized. Where this optical system is used for a copier or the like, exposure is carried out through a slit. The width and position of the slit greatly influence the irradiance for exposure and on unevenness in irradiance. According to the invention, optimum width and position of the slit can be selected to minimize the unevenness in irradiance and provide sufficient exposure.