The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1987
Filed:
Sep. 13, 1984
Applicant:
Inventors:
Assignee:
Stanley Electric Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C / ;
U.S. Cl.
CPC ...
118723 ; 118729 ; 118730 ; 118 501 ; 427 39 ;
Abstract
In a capacitance coupled type plasma CVD apparatus for depositing a thin film of reaction product of gas on a substrate by glow discharge at an elevated film-forming rate without lowering the function and ability of the formed film and to ensure the CVD operation to be carried out continuously or repetitively for an extended period of time, the electrode facing the substrate is provided as a net of a metal. The substrate is a cylindrical electrode, and the net-like electrode may be formed as a cylindrical net surrounding this cylindrical substrate, or as a pair of opposing flat sheets of net movably sandwiching rotating and movable plural cylindrical substrates therebetween.