The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 1987
Filed:
Dec. 27, 1984
Showgo Matsui, Sagamihara, JP;
Kenichi Kobayashi, Tokyo, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A method and an apparatus for inspecting a high density pattern in which a signal obtained by scanning a mask substrate having a high density pattern including repeated pattern portions is collated and compared with the signal obtained from original data used to generate the pattern. Repeated pattern data corresponding to the signal obtained by scanning said mask substrate and the repeated basic pattern data corresponding to the basic pattern of the repeated pattern portion are repeatedly collated and compared when inspecting repeated pattern portions and the repeated pattern data and the original pattern data obtained by sequentially converting the original data in synchronization with the scanning are collated and compared when inspecting the high density pattern of an area other than the repeated pattern portions.