The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 1987
Filed:
May. 13, 1985
Applicant:
Inventors:
Knut Heitmann, Wetzlar, DE;
Martin Hoppe, Wetzlar, DE;
Eckhard Schneider, Wetzlar, DE;
Andreas Thaer, Leihgestern, DE;
Assignee:
Ernst Leitz Wetzlar GmbH, Wetzlar, DE;
Primary Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ; G03F / ;
U.S. Cl.
CPC ...
430-3 ; 430328 ;
Abstract
A process for modifying structural profiles produced by polymerization or depolymerization in resist layers. As a function of the acoustic impedance of the substrate carrying the resist layer, the structures are irradiated with an ultrasonic beam. An ultrasonic beam for which the substrate represents a high impedance is used in order to enhance the contrast of the structures. An ultrasonic beam for which the substrate represents a low impedance is used to weaken the contrast. An acoustic microscope is especially suitable for carrying out the process.