The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 02, 1987
Filed:
Apr. 18, 1986
Walter Chapelle, Southfield, MI (US);
Zvi Yaniv, Southfield, MI (US);
Yair Baron, Southfield, MI (US);
Ovonic Imaging Systems, Inc., Troy, MI (US);
Abstract
An apparatus and method for exposing a film of radiation sensitive material overlying a substrate to a pattern of radiation utilizes proximity focusing of a mask pattern onto the film and step and repeat techniques for exposing the entire area of the film to be exposed. The apparatus includes a source of radiation, a substrate holder supporting the substrate with the film of radiation sensitive material thereon in the path of the radiation, and a mask holder for supporting the mask intermediate the radiation source and the film in close proximity thereto for proximity focusing the mask pattern onto the film. A stepping means incrementally moves the mask relative to the substrate to permit exposure of the film area.