The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 1987
Filed:
Nov. 29, 1985
Applicant:
Inventors:
Assignee:
RCA Corporation, Princeton, NJ (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03B / ; G03B / ; G03B / ;
U.S. Cl.
CPC ...
355 51 ; 354-4 ; 355 77 ;
Abstract
A high resolution periodic pattern is formed in a layer of a photosensitive material by means of a beam of light and a lenticular array formed of a plurality of lenslets. The lenticular array is positioned over the layer and the beam of light is directed through the lenticular array onto the layer. The beam of light is scanned across the lenticular array to pass through the individual lenslets which defines the light into a fine beam and thereby exposes a small area of the layer. The beam is shaped to achieve a periodic pattern in the layer as the beam scans across the layer. By moving the layer in synchronism with the scanning, a two dimensional array of the pattern can be obtained.