The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 1987
Filed:
May. 05, 1983
Applicant:
Inventors:
Osamu Kamiya, Machida, JP;
Keijiro Nishida, Kanagawa, JP;
Yasutomo Fujiyama, Yokohama, JP;
Kyosuke Ogawa, Sakorashimachi, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
427 39 ; 118 501 ; 118719 ; 118729 ; 42218629 ;
Abstract
An apparatus and a process for mass production of films by vacuum deposition comprise a substrate charging stage which is evacuated, an interconnecting stage which is positioned adjacent to said substrate charging stage and is evacuated, and a film forming stage which is removably attached to the interconnecting stage and is evacuated independently of the interconnecting stage.
Kamiya, Osamu. (1987). Apparatus and process for mass production of film by vacuum deposition (U.S. Patent No. 4666734). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4666734
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile