The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 1987
Filed:
Jul. 02, 1985
Applicant:
Inventors:
Shohei Inoue, Tokyo, JP;
Takuzo Aida, Tokyo, JP;
Assignee:
Hitachi Chemical Company Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08G / ;
U.S. Cl.
CPC ...
525419 ; 528356 ; 528357 ; 528366 ;
Abstract
A block copolymer having a narrow molecular weight distribution is produced by reacting an acid anhydride with an epoxide to yield a polyester, which is further reacted with a lactone, using a catalyst system comprising an aluminum porphyrin complex and an organic quaternary salt under mild reaction conditions.
Inoue, Shohei. (1987). Process for producing block copolymer (U.S. Patent No. 4665134). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/4665134
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile